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The intrinsic role of membrane morphology to reduce ...

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Filtration technology is an intrinsic part of the semicon- ductor manufacturing process to reduce defectivity, yet there are only a few types of filtration ... 4 pages
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The Intrinsic Role of MembraneMorphology to Reduce Defectivityin Advanced PhotochemicalsAuthors: T. Kohyama, Kozue Miura, Yasushi Ohyashiki, Aiwen WuABSTRACT—Defect source reduction in leading-edge iArF resists is a criticalrequirement to improve device performance and overall yieldin lithography manufacturing processes. It is believed that somepolar polymers can aggregate and be responsible for single ormultiple micro-bridge defects. Further investigation into theformation of these defects is needed. We have previously pre-sented the effective removal of gel-like polymers using nylonmedia.1 However, as the industry is moving to smaller featuresizes, there is a need to further improve the defect removalefficiency. In this paper, a filter, comprised of a novel mem-brane called Azora ™ with unique morphology and high-flowperformance, is introduced. This new filter shows better on-wafer and gel removal performance in an advanced ArF solutionthan conventional nylon. In addition, it shows i...